Executive Director, JUMP
With over 14 years of R&D experience spanning Intel’s 0.18 μm to 5 nm technology nodes, Todd has held technical leadership roles in advanced lithography, novel materials, and integrated photonics. Todd has always looked to maximize the industrial relevance and impact of fundamental academic research. He spent 3-years at IMEC in Belgium to ensure that both EUVL and DSA graduated from a pre-competitive, research phase to Intel’s technology development stage in 2013.
More recently, Todd has championed faster material innovation following the principles set forth in President Obama’s Materials Genome Initiative (MGI) by serving on the scientific advisory board for the NIST-sponsored, Center for Hierarchical Materials Design (CHiMaD).
In 2001, Todd obtained his Ph.D. in organometallic and polymer chemistry from the California Institute of Technology under the direction of Nobel Laureate Robert H. Grubbs.