2020 Technical Excellence Award

Presented to Professor Stacey Bent from Stanford University

Established in 1991, the Technical Excellence Award is an incentive and recognition program for research of exceptional value to SRC members. This prestigious award is shared equally among key contributors for innovative technology that significantly enhances the productivity and competitiveness of the semiconductor industry.

Essential aspects that are considered in the selection process include creativity, relevance to SRC research objectives, value to industry, and technology transfer.

This year, the 2020 honor is presented to Professor Stacey Bent from Stanford University, "for seminal contributions in area selective deposition and semiconductor patterning technologies that have accelerated sub-10nm scaling." Her accomplishments include her pioneering work in atomic layer deposition (ALD), including the use of self-assembled monolayers for ALD. Her research and leadership has opened up the new paradigm of area selective deposition (ASD) for controlled bottoms-up assembly. She has fostered and educated the best experts in the field of materials surface chemistry and its application to electronics

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