Session 15 - Patterning (TECHCON 2016)

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Monday 12-Sep-2016 3:40 - 4:55 PM Sabine
Session 15 - Patterning
15.1 3:40 PM MSR-Intel
PS-b-PMMA/Ionic Liquid Blends: A High-χ Drop-in Replacement for Sub-10 nm DSA

Xuanxuan Chen (Univ. of Chicago)
15.2 3:55 PM GRC
3D Metrology for Graphoepitaxial DSA Hole Shrink Process

Chun Zhou (Univ. of Chicago)
15.3 4:10 PM GRC
Polyoxometalate Hybrid Nano-Building Blocks for Extreme Ultra-Violet Photoresists

Brandon T. Hardie (Univ. of Idaho)
15.4 4:25 PM GRC
Characterization of HafSOx Inorganic Photoresists using Electron Stimulated Desorption and Raman Spectroscopy

Ryan Frederick (Oregon State Univ., Intel/SRCEA Fellow)
15.5 4:40 PM GRC
Characterization of Butyl Tin Photoresists

John T. Diulus (Oregon State Univ.)

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