Area‐Selective Oxidative‐Molecular Layer Deposition of Polymers (Option 2 of 2)

Abstract

Deposition-based patterning is becoming an important need to augment photolithography for improved alignment of printed features.  Area-selective deposition is used routinely for epitaxial transistor contacts, but reaction temperatures in excess of 800°C are needed.  For back-end applications, new ASD processes are needed that work at <400°C. This seminar will introduce the challenges of low temperature ASD of polymers, and summarize recent advances in this field. In particular, we will highlight emerging methods for oxidative deposition of conjugated polymers. Modeling studies allow us to quantitatively analyze the ASD results and compare our findings to other known approaches, and results will be helpful to understand opportunities and challenges in advanced deposition-based patterning.