Using Block Copolymers as Supercritical Fluid Developable Photoresists

• Application Type:

  Utility

  Patent Number:

  6379874

  Country:

  United States

  Status:

  Filed on 26-Oct-1999, Issued on 30-Apr-2002, Patent Abandoned

  Organization:

  Cornell University

  SRC Filing ID:

  P0097

Inventors

• Christopher K. Ober (Cornell)
• Narayan Sundararajan (Cornell)