Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates

• Application Type:

  Utility

  Patent Number:

  6746825

  Country:

  United States

  Status:

  Filed on 5-Oct-2001, Issued on 8-Jun-2004

  Organization:

  University of Wisconsin - Madison

  SRC Filing ID:

  P0293

Inventors

• Franco Cerrina (U of Wisconsin/Madison)
• Paul Nealey (U of Wisconsin/Madison)
• Juan de Pablo (U of Wisconsin/Madison)
• Harun Hadi Solak (U of Wisconsin/Madison)
• Xiao Min Yang (U of Wisconsin/Madison)
• Richard Peters (U of Wisconsin/Madison)
• Qiang Wang (U of Wisconsin/Madison)