Method for Correcting a Mask Design Layout
Inventors
- Puneet Gupta (UC/San Diego)
- Dennis M. Sylvester (Univ. of Michigan)
- Jie Yang (Univ. of Michigan)
- Andrew Kahng (UC/San Diego)
Related Patents
Method for Correcting a Mask Design Layout
Puneet Gupta (UC/San Diego); Andrew Kahng (UC/San Diego); Dennis M. Sylvester (Univ. of Michigan); Jie Yang (Univ. of Michigan)Patent Abandoned
Application Type: Continuation