Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates

• Application Type:

  Divisional

  Patent Number:

  6926953

  Country:

  United States

  Status:

  Filed on 15-Mar-2004, Issued on 9-Aug-2005

  Organization:

  University of Wisconsin - Madison

  SRC Filing ID:

  P0445

Inventors

• Paul Nealey (U of Wisconsin/Madison)
• Franco Cerrina (U of Wisconsin/Madison)