DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK COPOLYMER ASSEMBLY
Inventors
- Paul Nealey (U of Wisconsin/Madison)
- Huiman Kang (U of Wisconsin/Madison)
- Francois Detcheverry (U of Wisconsin/Madison)
- Juan de Pablo (U of Wisconsin/Madison)
- Ricardo Ruiz (Hitachi Ltd.)
- Thomas Albrecht (Hitachi Ltd.)
Related Patents
Methods to Enhance and Augment the Patterning Capabilities of Lithographic Materials and Process Using Block Copolymers
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Application Type: Provisional
Patterning Beyond the Limits of Lithographic Resolution
Thomas Albrecht (Hitachi Ltd.); Juan de Pablo (U of Wisconsin/Madison); Francois Detcheverry (U of Wisconsin/Madison); Huiman Kang (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Ricardo Ruiz (Hitachi Ltd.)Patent Application Expired
Application Type: Provisional
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Application Type: Utility