Atomic Layer Etching Processes Using Sequential, Self-Limiting Thermal Reactions Comprising Oxidation and Fluorination

    • Application Type:
      Utility
      Patent Number:
      10208383
      Country:
      United States
      Status:
      Filed on 8-Feb-2018, Issued on 19-Feb-2019
      Organization:
      University of Colorado at Boulder
      SRC Filing ID:
      P1687

    Inventors

    • Steven George (Univ. Colorado/Boulder)
    • Younghee Lee (Univ. Colorado/Boulder)
    • Nicholas R. Johnson (Univ. Colorado/Boulder)

    Related Patents

    P1686
    Application Expired
    GRC
    MSR-Intel

    New Thermal Atomic Layer Etching Processes Based on Oxidation, Conversion and Fluorination Reactions

    Steven George (Univ. Colorado/Boulder); Nicholas R. Johnson (Univ. Colorado/Boulder); Younghee Lee (Univ. Colorado/Boulder)
    Patent Application Expired
    Application Type: Provisional

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