METHOD FOR CORRECTING A MASK DESIGN LAYOUT
Inventors
- Andrew Kahng (UC/San Diego)
- Puneet Gupta (UC/San Diego)
- Dennis M. Sylvester (Univ. of Michigan)
- Jie Yang (Univ. of Michigan)
Related Patents
Methodology for Cost Driven Lithographic Correction Using Off-The-Shelf Synthesis Tools
Puneet Gupta (UC/San Diego); Andrew Kahng (UC/San Diego); Dennis M. Sylvester (Univ. of Michigan); Jie Yang (Univ. of Michigan)Patent Application Expired
Application Type: Provisional