Advanced Precursors for Selective Atomic Layer Deposition using Self-Assembled Monolayers

    • Application Type:
      Utility
      Country:
      United States
      Status:
      Filed on 1-Nov-2021, Published by Patent Office
      Organization:
      Stanford University
      SRC Filing ID:
      P1974

    Inventors

    • Stacey F. Bent (Stanford)
    • Ilkwon Oh (Stanford)

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    Application Type: Provisional

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