Determining the In-film Structures of Block Copolymer Directed Self-Assembly Using Resonant Soft X-ray Scattering

  • Authors:
    Jiaxing Ren (Univ. of Chicago), Daniel Sunday (NIST), Gurdaman Khaira (Univ. of Chicago), Shisheng Xiong (Argonne National Lab), Tamar Segal-Peretz (Argonne National Lab), Manolis Doxastakis (Argonne National Lab), Leonidas Ocola (Argonne National Lab), Ralu Divan (Argonne National Lab), Roel Gronheid (IMEC), R. Joseph Kline (NIST), Juan de Pablo (Univ. of Chicago), Paul Nealey (Univ. of Chicago)
    Publication ID:
    Publication Type:
    Received Date:
    Last Edit Date:
    2342.001 (University of Chicago)


Directed self-assembly (DSA) of block copolymers has the potential to revolutionize nanomanufacturing. In order to develop a fundamental understanding of the DSA process, it is important to characterize not only the top surface but also the structures inside the DSA film. Resonant Soft X-ray Scattering (RSoXS) has emerged as a powerful tool for through-film analysis due to its high contrast on block copolymer thin films. In this work we demonstrated the RSoXS characterization of two DSA systems: 1) Chemoepitaxy of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) lamella was performed on an industrial all-track process. The widths of guiding stripes were systematically varied and at certain stripe widths complicated 3D shapes could be found underneath the well-aligned surface. 2) Polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) lamella, a high χ system capable of self-assembling into the sub-10 nm regime, was studied with different X-ray energies and contrast mechanisms. RSoXS results were compared to that from TEM tomography and molecular simulations.

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