Determining the In-film Structures of Block Copolymer Directed Self-Assembly Using Resonant Soft X-ray Scattering
Directed self-assembly (DSA) of block copolymers has the potential to revolutionize nanomanufacturing. In order to develop a fundamental understanding of the DSA process, it is important to characterize not only the top surface but also the structures inside the DSA film. Resonant Soft X-ray Scattering (RSoXS) has emerged as a powerful tool for through-film analysis due to its high contrast on block copolymer thin films. In this work we demonstrated the RSoXS characterization of two DSA systems: 1) Chemoepitaxy of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) lamella was performed on an industrial all-track process. The widths of guiding stripes were systematically varied and at certain stripe widths complicated 3D shapes could be found underneath the well-aligned surface. 2) Polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) lamella, a high χ system capable of self-assembling into the sub-10 nm regime, was studied with different X-ray energies and contrast mechanisms. RSoXS results were compared to that from TEM tomography and molecular simulations.
Sunday, Sept. 20, 2015, 8 a.m. — Tuesday, Sept. 22, 2015, 10 p.m. CT
Austin, TX, United States
Technical conference and networking event for SRC members and students.