Determining the In-film Structures of Block Copolymer Directed Self-Assembly Using Resonant Soft X-ray Scattering

  • Authors:
    Jiaxing Ren (Univ. of Chicago), Daniel Sunday (Univ. of Chicago), Gurdaman Khaira (Univ. of Chicago), Shisheng Xiong (Univ. of Chicago), Tamar Segal-Peretz (Argonne National Lab), Emmanouil Doxastakis (Univ. of Houston), Leonidas E. Ocola (U of Wisconsin/Madison), Ralu Divan (Univ. of Chicago), Roel Gronheid (IMEC), R. Joseph Kline (Univ. of Chicago), Juan de Pablo (Univ. of Chicago), Paul Nealey (Univ. of Chicago)
    Publication ID:
    Publication Type:
    Received Date:
    Last Edit Date:
    2342.001 (University of Chicago)


Directed self-assembly (DSA) of block copolymers has the potential to revolutionize nanomanufacturing. In order to develop a fundamental understanding of the DSA process, it is important to characterize not only the top surface but also the structures inside the DSA film. Resonant Soft X-ray Scattering (RSoXS) has emerged as a powerful tool for through-film analysis due to its high contrast on block copolymer thin films. In this work we demonstrated the RSoXS characterization of two DSA systems: 1) Chemoepitaxy of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) lamella was performed on an industrial all-track process. The widths of guiding stripes were systematically varied and at certain stripe widths complicated 3D shapes could be found underneath the well-aligned surface. 2) Polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) lamella, a high χ system capable of self-assembling into the sub-10 nm regime, was studied with different X-ray energies and contrast mechanisms. RSoXS results were compared to that from TEM tomography and molecular simulations.

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20–22 September 2015
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