Report on the Determination of Influence of Varying Physicochemical Properties from Different CMP Processing Conditions on Short- and Long-term (> 10 days) Behavioral and Toxicity Measurements

  • Authors:
    Shyam Aravamudhan (NC A&T)
    Publication ID:
    P090019
    Publication Type:
    Deliverable Report
    Received Date:
    31-Dec-2016
    Last Edit Date:
    13-Feb-2017
    Research:
    425.051 (North Carolina A&T State University)

Research Report Highlight

Report summarizes the studies of physical and chemical characteristics of (a) composite filler material BN nanoparticles before and after thermal degradation and (b) pristine slurries and spent CMP waste after polishing of GaAs and HDP oxide films.

Abstract

This report summarizes the studies performed to understand the physical and chemical characteristics of (a) composite filler material, namely boron nitride nanoparticles before and after thermal degradation and (b) pristine slurries and spent CMP waste after polishing of GaAs and HDP oxide films. In addition, this report also provides preliminary determination of half maximal inhibitory concentration (IC50) from the dose-response curves with both pre (pristine) and post (transformed) nanoparticles. Finally, Arsenic speciation results are presented from the analysis of GaAs CMP waste generated by polishing GaAs wafers using colloidal silica nanoparticle based slurry.

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