Final Report on the Use of Etchless BCP Methods in Device Manufacture
In this final report, we summarize the methodology be which patterns of materials can be developed at a surface without the need of etch based patterning. Here, block copolymer patterns are used as a template and selected blocks infilled with inorganic precursors. These composite films can then be processed to yield an inorganic material mimic of the original block copolymer morphological arrangement. We will summarize the materials that can be prepared and limitations in synthesis in terms of size and composition. The possible uses of the materials in semiconductor fabrication are described. Finally, we will postulate on the developments needed to realize further applications.