Interfacial Charge Engineering for Enhanced Ferroelectric-Control of Strongly Correlated Oxides

  • Authors:
    Xuegang Chen (U Nebraska/Lincoln), Xin Zhang (U Nebraska/Lincoln), Mark Koten (U Nebraska/Lincoln), Hanghui Chen (New York University-Shanghai), Zhiyong Xiao (U Nebraska/Lincoln), Le Zhang (U Nebraska/Lincoln), Jeffrey E. Shield (U Nebraska/Lincoln), Peter Dowben (U Nebraska/Lincoln), Xia Hong (U Nebraska/Lincoln)
    Publication ID:
    P090198
    Publication Type:
    Presentation
    Received Date:
    2-Feb-2017
    Last Edit Date:
    2-Feb-2017
    Research:
    2398.002 (University of Nebraska/Lincoln)

Abstract

This presentation was given at the 7th Annual Electronic Materials and Applications Conference in Orlando, FL on January 18, 2017.

4819 Emperor Blvd, Suite 300 Durham, NC 27703 Voice: (919) 941-9400 Fax: (919) 941-9450