Interfacial Charge Engineering for Enhanced Ferroelectric-Control of Strongly Correlated Oxides

  • Authors:
    Xuegang Chen (U Nebraska/Lincoln), Xin Zhang (U Nebraska/Lincoln), Mark Koten (U Nebraska/Lincoln), Hanghui Chen (New York University-Shanghai), Zhiyong Xiao (U Nebraska/Lincoln), Le Zhang (U Nebraska/Lincoln), Jeffrey E. Shield (U Nebraska/Lincoln), Peter Dowben (U Nebraska/Lincoln), Xia Hong (U Nebraska/Lincoln)
    Publication ID:
    Publication Type:
    Received Date:
    Last Edit Date:
    2398.002 (University of Nebraska/Lincoln)


This presentation was given at the 7th Annual Electronic Materials and Applications Conference in Orlando, FL on January 18, 2017.

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