Hybrid Nano-Building Blocks for Pixelated EUV Photoresists and Dielectric Thin-Films

  • Authors:
    Brandon T. Hardie (Univ. of Idaho), Mark F. Roll (Univ. of Idaho)
    Publication ID:
    Publication Type:
    Annual Review
    Received Date:
    Last Edit Date:
    2439.001 (University of Idaho)


This publication outlines the research accomplishments of the past year as a part of Task 2439.001. The completion of a UV (i-line) contrast curves for polyoxometalate/epoxide hybrid resists allowed for structure property relationships in resist composition to be detailed. Extension to electron beam exposures allowed for comparison of negative-tone action, photo-acid diffusion, and apparent secondary electron scattering effects. Future research directions and potential for extension to other resist systems are discussed.

Past Events

  Event Summary
27–28 June 2017
Nanomanufacturing Materials and Processes (NMP) Review
Tuesday, June 27, 2017, 8 a.m. — Wednesday, June 28, 2017, 5 p.m. PT
Stanford, CA, United States

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