Hybrid Nano-Building Blocks for Pixelated EUV Photoresists and Dielectric Thin-Films
This publication outlines the research accomplishments of the past year as a part of Task 2439.001. The completion of a UV (i-line) contrast curves for polyoxometalate/epoxide hybrid resists allowed for structure property relationships in resist composition to be detailed. Extension to electron beam exposures allowed for comparison of negative-tone action, photo-acid diffusion, and apparent secondary electron scattering effects. Future research directions and potential for extension to other resist systems are discussed.
|Nanomanufacturing Materials and Processes (NMP) Review|
Tuesday, June 27, 2017, 8 a.m. — Wednesday, June 28, 2017, 5 p.m. PT
Stanford, CA, United States