Mechanistic Studies of Inorganic Resists
The focus of the research is to characterize radiation induced mechanisms in inorganic photoresists. In this presentation we highlight recent ambient pressure X-ray photoelectron spectroscopy results.
|Nanomanufacturing Materials and Processes (NMP) Review|
Tuesday, June 27, 2017, 8 a.m. — Wednesday, June 28, 2017, 5 p.m. PT
Stanford, CA, United States