Thermal Atomic Layer Etching of Metal Gates

  • Authors:
    Steven George (U. of Colorado/Boulder)
    Publication ID:
    P091152
    Publication Type:
    Presentation
    Received Date:
    22-Jun-2017
    Last Edit Date:
    23-Jun-2017
    Research:
    2659.001 (University of Colorado/Boulder)

Abstract

This presentation describes results for WO3 and W ALE using "conversion-fluorination" and "oxidation-conversion-fluorination" etching mechanisms.

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27–28 June 2017
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Nanomanufacturing Materials and Processes (NMP) Review
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