Thermal Atomic Layer Etching of Metal Gates

  • Authors:
    Steven George (U. of Colorado/Boulder)
    Publication ID:
    P091152
    Publication Type:
    Presentation
    Received Date:
    22-Jun-2017
    Last Edit Date:
    23-Jun-2017
    Research:
    2659.001 (University of Colorado/Boulder)

Abstract

This presentation describes results for WO3 and W ALE using "conversion-fluorination" and "oxidation-conversion-fluorination" etching mechanisms.

Past Events

  Event Summary
27–28 June 2017
GRC
GRC
Nanomanufacturing Materials and Processes (NMP) Review
Tuesday, June 27, 2017, 8 a.m. — Wednesday, June 28, 2017, 5 p.m. PT
Stanford, CA, United States

4819 Emperor Blvd, Suite 300 Durham, NC 27703 Voice: (919) 941-9400 Fax: (919) 941-9450

Important Information for the SRC website. This site uses cookies to store information on your computer. By continuing to use our site, you consent to our cookies. If you are not happy with the use of these cookies, please review our Cookie Policy to learn how they can be disabled. By disabling cookies, some features of the site will not work.