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SRC and Stanford Develop Unique Combination of Elements for Thermal Nanotape That Transforms Packaging Applications
Novel Nanostructured Materials Promise Longer Device Life for Less Cost than Current Solder Solutions
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Potential opportunities for nanotechnology in electronics manufacturing
TI Fellow Robert Doering writes in ElectroIQ about nanotechnology's potential.
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Directed Block Copolymer Self-assembly for Nanoelectronics Fabrication
Review article by Dan Herr on directed self-assembly for nanoelectronics applications is now available
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DARPA funds spintronic and nanomagnet research at FCRP and NRI Centers
DARPA wants a new type of computer logic, funds UCLA and Notre Dame to find it.
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SWAN Professor Helps Develop First High-Temp Spin-Field-Effect Transistor
Texas A&M University physicist Jairo Sinova has announced a breakthrough
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ElectroIQ.com publishes video interviews from TECHCON 2010
ElectroIQ.com publishes video interviews from TECHCON 2010
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EETimes Touts SRC as Benchmark of Industry-Academia Collaboration
SRC performs the kind of long-term research that will keep the United States at the forefront of semiconductor technology, says EETimes.
Press Release
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Two Semiconductor Research Corporation Directors Named as IEEE Fellows
Kwok Ng and Jeff Welser Are Latest from SRC to Receive IEEE Professional Honor
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SEMATECH, SIA and SRC Team to Establish New Collaborative Program for Enabling 3D ICs
Industry pulls together to develop industry standards to guide 3D integration and accelerate technology adoption
Press Release
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Andras Moritz's group was recognized with Best Student Paper award
Andras Moritz's group was recently recognized with the Best Student Paper award.
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Ehsan Afshari, Cornell University, wins Michael Tien Excellence in Teaching Award
Ehsan Afshari, Cornell University, wins Michael Tien Excellence in Teaching Award
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University of Michigan team wins GSRC Margarida Jacome Best Poster/Demo Award
Andrea Pellegrini, University of Michigan, receives GSRC Margarida Jacome Best Poster/Demo Award 2010
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GSRC Research featured in IEEE Spectrum
GSRC Research on Error-Tolerant-Computing featured in November, 2010 issue of IEEE Spectrum
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GRC CADTS Featured Publication
New software produces 15%-20% reduction in mask complexity and cost for 28 nm self-aligned double patterning.
Featured Publication