The 2011 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics will be held May 23-27, 2011 at the MINATEC Campus in Grenoble, France. The conference will examine the latest advances in characterization and metrology that will help shape the future of the nanoelectronics revolution.  Many outstanding speakers have already been confirmed for this event, including our three keynote speakers:  Michel Brillouet, Deputy Director, CEA LETI; Udo Nothelfer, VP and General Manager, Global Foundries; and Rudi Cartuyvels, VP Process Technology and General Manager, IMEC.  (Please see link above for the full list of confirmed speakers.)  This is an excellent opportunity for you to participate by submitting an abstract for a contributed poster to demonstrate your expertise and accomplishments in nanoelectronics.  Posters will be displayed in separate sessions throughout the conference.  The conference papers will be published in a hardback proceedings by the American Institute of Physics.

For the first conference in this series to be held outside of the United States, the organizers have chosen to hold the conference at the MINATEC Campus in Grenoble, France. The campus is home to 2,400 researchers, 1,200 students, and 600 technology transfer experts on a state-of-the-art 20-hectare campus offering 10,000 square meters of clean room space. An international center for micro and nanotechnologies, the MINATEC campus is unlike any other research facility in Europe.

Call for Poster Papers - A call-for-papers brochure is available on-line. Papers are solicited to address characterization and metrology for:

300 mm; Alternative Gate Dielectrics; Beyond CMOS; Breakthroughs in Electron Microscopy; Breakthroughs in Lithography; Channel Engineering (e.g., strained silicon, 3/5s); Contamination, Detection, and Identification; Critical Analytical Techniques; Defects; Device Manufacturing; Diagnostics; Embedded or Buried Interfaces; In-Situ, Real-Time Control and Monitoring; Integrated Metrology; Interconnects - Present or Future; Lab-on-a-Chip; MEMS/NEMS Metrology Applications; Modeling/Simulation; Nanoelectronics Materials and Devices; Non-Destructive Atomic Scale Methods; Novel Measurement Methods, Breakthroughs; Thin-Films; Ultra-Shallow Junctions; Wafer Fab; Wafer Manufacturing and New Substrate Materials

One-page, camera-ready abstracts must be received by December 20, 2010.  The template is available in the “Author Instructions” section of the conference website.  The cover page must include the name, address, telephone and fax numbers, and e-mail address of the contact author.  Please include three key words that best describe your paper at the end of the abstract.  Also, you are encouraged to provide at least one figure presenting data.  Please note, if your abstract is accepted, it will appear in the conference abstract book and final program as submitted.  Notice of acceptance of papers will be given by January 31, 2011. 

Address all abstracts to the conference publications coordinator, Erik Secula (erik.secula@nist.gov). Please send Microsoft Word or Adobe PDF files. If e-mail is not a practical option, please contact Erik Secula at (301) 975-2050 to make alternate arrangements.

Technical Contact: David G. Seiler, email: david.seiler@nist.gov, 301-975-2074

Registration - The registration fee for the conference includes coffee breaks, lunches, a banquet, an extended abstract booklet, and a hardback book containing the workshop papers, along with a CD-ROM.  The registration fee is 450 €.  Students and post-docs may register for 300 €.  On-line registration is now available!