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GRC Science Area
LIT – Lithography Sciences
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| 1 through 6 of
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- 1:
Method of Locating Areas in an Image Such as a Photo Mask Layout...
- Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB
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- 2:
Multi-Layered Attenuated Phase Shift Mask and a Method for Making...
- Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB
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- 3:
Method and Apparatus for Providing Film Stress Measurements Based...
- Method and Apparatus for Providing Film Stress Measurements Based on Substrates Displacement Application Type: Utility Patent Number: 6826491 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0209/
Modified: 2004-11-30 - 22KB
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- 4:
CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
- CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB
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- 5:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Continuation (in part) Patent Number: 5637544 Country: ...
URL: https://www.src.org/library/patent/p0011/
Modified: 1997-06-10 - 25KB
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- 6:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Divisional Patent Number: 5635148 Country: United States ...
URL: https://www.src.org/library/patent/p0009/
Modified: 1997-06-03 - 25KB
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