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- 1:
New Precursors and Processes for The Thermal ALD of Cobalt Metal...
- New Precursors and Processes for The Thermal ALD of Cobalt Metal Thin Films Application Type: Utility Country: United States Status: Filed on 21-Jul-2020, Published by Patent ...
URL: https://www.src.org/library/patent/p1863/
Modified: 2020-07-21 - 26KB
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- 2:
Method of Forming Low-Resistivity RU ALD Through a BI-Layer Process...
- Method of Forming Low-Resistivity RU ALD Through a BI-Layer Process and Related Structures Application Type: Utility Country: United States Status: Filed on 6-Dec-2022, Published ...
URL: https://www.src.org/library/patent/p2099/
Modified: 2022-12-06 - 23KB
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