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IMPACT-T1 – Materials for Scaled Reconfigurable and mm-Wave Interconnects
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Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated...
- Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated Circuits (ICS) Application Type: Utility Country: United States Status: Filed on 8-Dec-2021, Published by Patent ...
URL: https://www.src.org/library/patent/p2000/
Modified: 2021-12-08 - 23KB Find Similar Documents
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