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PatMat – Patterning Materials

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LIT – Lithography Sciences 1
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1 through 1 of 1 similar documents, best matches first.   
1: Attenuated Phase Shift Mask and a Method for Making the Mask...
Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 6309780 Country: United States Status: Filed on 15-Jun-1999, Issued on ...
URL: https://www.src.org/library/patent/p0380/
Modified: 2001-10-30 - 22KB
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