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- 1: Atomic Layer Etching Processes Using Sequential, Self-Limiting...
- Atomic Layer Etching Processes Using Sequential, Self-Limiting Thermal Reactions Comprising Oxidation and Fluorination Application Type: Utility Patent Number: 10208383 Country: ...
URL: https://www.src.org/library/patent/p1687/
Modified: 2019-02-19 - 29KB
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