Questions?
[x] Content Type
Patent Filings

[x] Thrust/Theme
PatMat – Patterning Materials

SRC Program
GRC 5

GRC Science Area
LIT – Lithography Sciences 5
NMS – Nanomanufacturing Sciences 4
MPS – Material & Process Science... 1

1 through 5 of 5 similar documents, best matches first.   
1: Water-Soluble Photoinitiators (Patent P0013) - SRC
Water-Soluble Photoinitiators Application Type: Utility Patent Number: 5648196 Country: United States Status: Filed on 14-Jul-1995, Issued on 15-Jul-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0013/
Modified: 1997-07-15 - 24KB
Find Similar Documents
2: Water-Processable Photoresist Compositions (Patent P0282) - SRC
Water-Processable Photoresist Compositions Application Type: European Patent Office Patent Number: EP1240552 Status: Filed on 14-Aug-2000, Issued on 8-Sep-2005, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0282/
Modified: 2005-09-08 - 26KB
Find Similar Documents
3: Water-Processable Photoresist Compositions (Patent P0186) - SRC
Water-Processable Photoresist Compositions Application Type: Utility Patent Number: 6399273 Country: United States Status: Filed on 14-Aug-2000, Issued on 4-Jun-2002, Patent ...
URL: https://www.src.org/library/patent/p0186/
Modified: 2002-06-04 - 26KB
Find Similar Documents
4: Water-Processable Photoresist Compositions (Patent P0272) - SRC
Water-Processable Photoresist Compositions Application Type: Foreign National Patent Number: 2001-517217 Country: Japan Status: Filed on 14-Aug-2000, Issued on 5-Feb-2005 ...
URL: https://www.src.org/library/patent/p0272/
Modified: 2005-02-05 - 26KB
Find Similar Documents
5: Photoresist Compositions Comprising Norbornene Derivative Polymers...
Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups Application Type: Utility Patent Number: 6103445 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0096/
Modified: 2000-08-15 - 23KB
Find Similar Documents