Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups

• Application Type:

  Utility

  Patent Number:

  6103445

  Country:

  United States

  Status:

  Filed on 7-Mar-1997, Issued on 15-Aug-2000, Patent Expired

  Organization:

  University of Texas at Austin

  SRC Filing ID:

  P0096

Inventors

• Grant Willson (UT/Austin)
• David Medeiros (UT/Austin)
• Uzodinma Okoroanyanwu (UT/Austin)