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IMPACT-T1 – Materials for Scaled Reconfigurable and mm-Wave Interconnects

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IMPACT 2

1 through 2 of 2 similar documents, best matches first.   
1: Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated...
Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated Circuits (ICS) Application Type: Utility Country: United States Status: Filed on 8-Dec-2021, Published by Patent ...
URL: https://www.src.org/library/patent/p2000/
Modified: 2021-12-08 - 23KB
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2: Low-Power Phase Change Memory Technology with Interfacial Thermoelectr...
Low-Power Phase Change Memory Technology with Interfacial Thermoelectric Heating Enhancement Application Type: Utility Country: United States Status: Filed on 11-Oct-2021, ...
URL: https://www.src.org/library/patent/p1975/
Modified: 2021-10-11 - 24KB
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