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- 1:
Leveraging Precursor Molecular Composition and Structure for...
- Leveraging Precursor Molecular Composition and Structure for Atomic Layer Etching Application Type: Utility Patent Number: 11171013 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1756/
Modified: 2021-11-09 - 25KB
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- 2:
Method for ALD Deposition on Inert Surfaces Via Al203 Nanoparticles...
- Method for ALD Deposition on Inert Surfaces Via Al203 Nanoparticles Application Type: Utility Patent Number: 11127590 Country: United States Status: Filed on 5-Dec-2017, Issued on ...
URL: https://www.src.org/library/patent/p1750/
Modified: 2021-09-21 - 25KB
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