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| 1 through 3 of 3 similar documents, best matches first. | ||
- 1: Leveraging Precursor Molecular Composition and Structure for...
- Leveraging Precursor Molecular Composition and Structure for Atomic Layer Etching Application Type: Utility Patent Number: 11171013 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1756/
Modified: 2021-11-09 - 25KB
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- 2: Achieving Etching Selectivity for Atomic Layer Etching Processes...
- Achieving Etching Selectivity for Atomic Layer Etching Processes by Utilizing Material-Selective Deposition Phenomena Application Type: Utility Patent Number: 10790157 Country: ...
URL: https://www.src.org/library/patent/p1842/
Modified: 2020-09-29 - 22KB
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- 3: Atomic Layer Etching Processes Using Sequential, Self-Limiting...
- Atomic Layer Etching Processes Using Sequential, Self-Limiting Thermal Reactions Comprising Oxidation and Fluorination Application Type: Utility Patent Number: 10208383 Country: ...
URL: https://www.src.org/library/patent/p1687/
Modified: 2019-02-19 - 29KB
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