[x]
Content Type
Patent Filings
[x]
GRC Science Area
DS – Device Sciences
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| 1 through 13 of
13 similar documents, best matches first. |
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- 1:
Methods of Forming Polycrystalline Semiconductor Waveguides of...
- Methods of Forming Polycrystalline Semiconductor Waveguides of Optoelectronic Integrated Circuits, and Devises Formed Thereby Application Type: Utility Patent Number: 5841931 ...
URL: https://www.src.org/library/patent/p0051/
Modified: 1998-11-24 - 25KB
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- 2:
Growth of Inorganic Thin Films using Self-Assembled Monolayers...
- Growth of Inorganic Thin Films using Self-Assembled Monolayers as Nucleation Sites Application Type: Utility Patent Number: 7829150 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1139/
Modified: 2010-11-09 - 22KB
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- 3:
Digitally Self-Calibrating pipeline Analog-to-Digital Converter...
- Digitally Self-Calibrating pipeline Analog-to-Digital Converter Application Type: Utility Patent Number: 5499027 Country: United States Status: Filed on 24-Feb-1994, Issued on ...
URL: https://www.src.org/library/patent/p0024/
Modified: 1996-03-12 - 22KB
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- 4:
High Capacitance Density Gate Dielectrics for III-V Semiconductor...
- High Capacitance Density Gate Dielectrics for III-V Semiconductor Channels Using a Pre-Disposition Surface Treatment Involving Plasma and Ti Precursor Exposure Application Type: ...
URL: https://www.src.org/library/patent/p1506/
Modified: 2015-11-17 - 22KB
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- 5:
Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit...
- Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit Field Effect Transistors and Methods of Fabricating Same Application Type: Foreign National Patent Number: NI154861 ...
URL: https://www.src.org/library/patent/p0580/
Modified: 2008-12-01 - 22KB
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- 6:
Semiconductor Devices Having an Interfacial Dielectric Layer...
- Semiconductor Devices Having an Interfacial Dielectric Layer and Related Methods Application Type: Utility Patent Number: 7507629 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0450/
Modified: 2009-03-24 - 23KB
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- 7:
Method for Cleaning, Passivation and Functionalization of SI...
- Method for Cleaning, Passivation and Functionalization of SI-GE Semiconductor Sufraces Application Type: Divisional Patent Number: 10483097 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1734/
Modified: 2019-11-19 - 25KB
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- 8:
Electrical Device Including Dielectric Layer Formed By Direct...
- Electrical Device Including Dielectric Layer Formed By Direct Patterning Process Application Type: Divisional Patent Number: 6946736 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0327/
Modified: 2005-09-20 - 22KB
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- 9:
Method for In-Situ Dry Cleaning, Passivation, Functionalization...
- Method for In-Situ Dry Cleaning, Passivation, Functionalization of SI-GE Semiconductor Surfaces Application Type: Utility Patent Number: 9818599 Country: United States Status: ...
URL: https://www.src.org/library/patent/p1429/
Modified: 2017-11-14 - 25KB
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- 10:
Method for in-SITU Dry Cleaning, Passivation, and Functionalization...
- Method for in-SITU Dry Cleaning, Passivation, and Functionalization of GE Semiconductor Surfaces Application Type: Utility Patent Number: 9117653 Country: United States Status: ...
URL: https://www.src.org/library/patent/p1477/
Modified: 2015-08-25 - 25KB
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- 11:
Methods of Fabricating Strained Semiconductor-On-Insulator Field...
- Methods of Fabricating Strained Semiconductor-On-Insulator Field-Effect Transistors And Related Devices Application Type: Utility Patent Number: 7211458 Country: United States ...
URL: https://www.src.org/library/patent/p0523/
Modified: 2007-05-01 - 22KB
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- 12:
Selective Deposition of Doped Silicon-Germanium Alloy on Semiconductor...
- Selective Deposition of Doped Silicon-Germanium Alloy on Semiconductor Substrate, and Resulting Structures Application Type: Divisional Patent Number: 5336903 Country: United ...
URL: https://www.src.org/library/patent/p0063/
Modified: 1994-08-09 - 22KB
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- 13:
Method for Forming a Layer of Uniform Thickness On a Semiconductor...
- Method for Forming a Layer of Uniform Thickness On a Semiconductor Wafer During Rapid Thermal Processing Application Type: Utility Patent Number: 5439850 Country: United States ...
URL: https://www.src.org/library/patent/p0033/
Modified: 1995-08-08 - 21KB
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