Questions?
[x] Content Type
Patent Filings

[x] GRC Science Area
LIT – Lithography Sciences

SRC Program
GRC 5

Thrust/Theme
Pat(MPS) – Patterning 2
CFM&TCM – CFM & Total Chemical M... 1
MTMP – Metrology Tools Matls & P... 1
PatMat – Patterning Materials 1

1 through 5 of 5 similar documents, best matches first.   
1: Multi-Layered Attenuated Phase Shift Mask and a Method for Making...
Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB
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2: Attenuated Phase Shift Mask and a Method for Making the Mask...
Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 6309780 Country: United States Status: Filed on 15-Jun-1999, Issued on ...
URL: https://www.src.org/library/patent/p0380/
Modified: 2001-10-30 - 22KB
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3: Apparatus and Method for Shaping and Detecting a Particle Beam...
Apparatus and Method for Shaping and Detecting a Particle Beam Application Type: Utility Patent Number: 5270542 Country: United States Status: Filed on 31-Dec-1992, Issued on ...
URL: https://www.src.org/library/patent/p0197/
Modified: 1993-12-14 - 22KB
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4: Methods, Apparatus and Computer Program Products for Self-Calibrating...
Methods, Apparatus and Computer Program Products for Self-Calibrating Two-Dimensional Metrology Stages Application Type: Utility Patent Number: 5798947 Country: United States ...
URL: https://www.src.org/library/patent/p0017/
Modified: 1998-08-25 - 22KB
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5: Systems, Methods and Computer Program Products for Detecting...
Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB
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