[x]
Thrust/Theme
[x]
SRC Program
[x]
GRC Science Area
| Content Type |
| Patent Filings | 3 |
| Other | 1 |
| 1 through 4 of 4 similar documents, best matches first. | ||
- 1: Twin Mask, and Method and System for Using Same to Pattern Microelectr...
- Twin Mask, and Method and System for Using Same to Pattern Microelectronic Substrates Application Type: Utility Patent Number: 5438204 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0034/
Modified: 1995-08-01 - 22KB
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- 2: Stress-Free Mount for Imaging Mask (Patent P0056) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Divisional Patent Number: 5675403 Country: United States Status: Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0056/
Modified: 1997-10-07 - 24KB
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- 3: Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB
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- 4: Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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