Stress-Free Mount for Imaging Mask

• Application Type:

  Divisional

  Patent Number:

  5675403

  Country:

  United States

  Status:

  Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired

  Organization:

  University of Wisconsin - Madison

  SRC Filing ID:

  P0056

Inventors

• Franco Cerrina (U of Wisconsin/Madison)
• John Wallace (U of Wisconsin/Madison)