Questions?
[x] Content Type
Patent Filings

[x] GRC Science Area
NMS – Nanomanufacturing Sciences

SRC Program
GRC 3

Center
EBSM 3

Thrust/Theme
ESH – Environment Safety and Hea... 3

1 through 3 of 3 similar documents, best matches first.   
1: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
Find Similar Documents
2: Method for Patterning a Radiation Sensitive Layer (Patent P0087...
Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
Find Similar Documents
3: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
Find Similar Documents