Method for Patterning a Radiation Sensitive Layer

• Application Type:

  Utility

  Patent Number:

  6509138

  Country:

  United States

  Status:

  Filed on 12-Jan-2000, Issued on 21-Jan-2003

  Organization:

  Massachusetts Institute of Technology

  SRC Filing ID:

  P0087

Inventors

• Karen K. Gleason (MIT)
• Christopher K. Ober (Cornell)
• Daniel J. C. Herr (SRC)