Questions?
[x] Content Type
Patent Filings

[x] GRC Science Area
MPS – Material & Process Sciences

SRC Program
GRC 6

Center
EBSM 3

Thrust/Theme
ESH – Environment Safety and Hea... 3
Back End Processes 1
Front End Processes 1
Pat(MPS) – Patterning 1

1 through 6 of 6 similar documents, best matches first.   
1: Method for Patterning a Radiation Sensitive Layer (Patent P0087...
Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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2: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
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3: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
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4: Passivated Copper Conductive Layers for Microelectronic Applications...
Passivated Copper Conductive Layers for Microelectronic Applications and Methods of Manufacturing Same Application Type: Utility Patent Number: 5766379 Country: United States ...
URL: https://www.src.org/library/patent/p0015/
Modified: 1998-06-16 - 24KB
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5: Semiconductor Devices Having an Interfacial Dielectric Layer...
Semiconductor Devices Having an Interfacial Dielectric Layer and Related Methods Application Type: Utility Patent Number: 7507629 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0450/
Modified: 2009-03-24 - 23KB
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6: Multi-Layered Attenuated Phase Shift Mask and a Method for Making...
Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB
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1 through 6 of 6 similar documents, best matches first.