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Pat(MPS) – Patterning

Content Type
Patent Filings 5
Other 1

SRC Program
GRC 6

Center
ACE4S 1
CAIST 1
CDADIC 1
CEMPI 1
CHIRP 1
EBSM 1
IPC 1
NCRC 1
TxACE 1

GRC Science Area
MPS – Material & Process Science... 6
LIT – Lithography Sciences 5
NMS – Nanomanufacturing Sciences 2
CADTS – Computer Aided Design & ... 1
CSR – Cross-disciplinary Semicon... 1
DES – Design Sciences 1
DS – Device Sciences 1
ES-H – Environmental Safety & He... 1
FAC – Factory Sciences 1
GEN – General 1
ICSS – Integrated Circuit & Syst... 1
INT – Interconnect Sciences 1
IPS – Interconnect & Packaging S... 1
ISA – Industrial Support Activit... 1
MBP – Materials & Bulk Processes... 1
MFG – Manufacturing Sciences 1
MFGPS – Manufacturing Process Sc... 1
MIC – Microstructure Sciences 1
MSS – Manufacturing Systems Scie... 1
NIS – Nanostructure & Integratio... 1
PID – Process Integration & Devi... 1
PKG – Packaging Sciences 1
SMS – Semiconductor Modeling & S... 1
SRCEA – SRC Education Alliance 1
TT – Technology Transfer 1

1 through 6 of 6 similar documents, best matches first.   
1: Semiconductor Research Corporation - SRC
GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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2: System and Method Converting the Polarization State of an Optical...
System and Method Converting the Polarization State of an Optical Beam into an Inhomogenously Polarized State Application Type: Utility Patent Number: 7414786 Country: United ...
URL: https://www.src.org/library/patent/p0496/
Modified: 2008-08-19 - 24KB
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3: Systems, Methods and Computer Program Products for Detecting...
Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB
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4: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB
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5: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Foreign National Patent Number: NI-154578 Country: Taiwan Status: Filed on 21-Feb-2001, ...
URL: https://www.src.org/library/patent/p0267/
Modified: 2002-05-01 - 22KB
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6: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Utility Patent Number: 6730443 Country: United States Status: Filed on 12-Feb-2001, Issued on ...
URL: https://www.src.org/library/patent/p0195/
Modified: 2004-05-04 - 22KB
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1 through 6 of 6 similar documents, best matches first.