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1 through 7 of 7 similar documents, best matches first.   
1: Semiconductor Research Corporation - SRC
GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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2: Water-Processable Photoresist Compositions (Patent P0186) - SRC
Water-Processable Photoresist Compositions Application Type: Utility Patent Number: 6399273 Country: United States Status: Filed on 14-Aug-2000, Issued on 4-Jun-2002, Patent ...
URL: https://www.src.org/library/patent/p0186/
Modified: 2002-06-04 - 26KB
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3: Water-Processable Photoresist Compositions (Patent P0272) - SRC
Water-Processable Photoresist Compositions Application Type: Foreign National Patent Number: 2001-517217 Country: Japan Status: Filed on 14-Aug-2000, Issued on 5-Feb-2005 ...
URL: https://www.src.org/library/patent/p0272/
Modified: 2005-02-05 - 26KB
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4: Water-Processable Photoresist Compositions (Patent P0282) - SRC
Water-Processable Photoresist Compositions Application Type: European Patent Office Patent Number: EP1240552 Status: Filed on 14-Aug-2000, Issued on 8-Sep-2005, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0282/
Modified: 2005-09-08 - 26KB
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5: Water-Soluble Photoinitiators (Patent P0013) - SRC
Water-Soluble Photoinitiators Application Type: Utility Patent Number: 5648196 Country: United States Status: Filed on 14-Jul-1995, Issued on 15-Jul-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0013/
Modified: 1997-07-15 - 24KB
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6: Attenuated Phase Shift Mask and a Method for Making the Mask...
Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 6309780 Country: United States Status: Filed on 15-Jun-1999, Issued on ...
URL: https://www.src.org/library/patent/p0380/
Modified: 2001-10-30 - 22KB
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7: Photoresist Compositions Comprising Norbornene Derivative Polymers...
Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups Application Type: Utility Patent Number: 6103445 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0096/
Modified: 2000-08-15 - 23KB
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1 through 7 of 7 similar documents, best matches first.