[x]
Content Type
Patent Filings
[x]
GRC Science Area
NMS – Nanomanufacturing Sciences
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| 1 through 7 of
7 similar documents, best matches first. |
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- 1:
Enhanced Stripping of Implanted Resists (Patent P1259) - SRC
- Enhanced Stripping of Implanted Resists Application Type: Utility Patent Number: 8772170 Country: United States Status: Filed on 29-Dec-2010, Issued on 8-Jul-2014, Patent Abandoned ...
URL: https://www.src.org/library/patent/p1259/
Modified: 2014-07-08 - 25KB
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- 2:
Modification of Polyvinylidene Fluoride Membrane and Method of...
- Modification of Polyvinylidene Fluoride Membrane and Method of Filtering Application Type: Utility Patent Number: 5531900 Country: United States Status: Filed on 7-Jul-1994, Issued ...
URL: https://www.src.org/library/patent/p0020/
Modified: 1996-07-02 - 22KB
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- 3:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Continuation (in part) Patent Number: 5637544 Country: ...
URL: https://www.src.org/library/patent/p0011/
Modified: 1997-06-10 - 25KB
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- 4:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Divisional Patent Number: 5635148 Country: United States ...
URL: https://www.src.org/library/patent/p0009/
Modified: 1997-06-03 - 25KB
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- 5:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
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- 6:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
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- 7:
Method for Patterning a Radiation Sensitive Layer (Patent P0087...
- Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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7 similar documents, best matches first. |
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