Questions?
[x] GRC Science Area
LIT – Lithography Sciences

Content Type
Patent Filings 10
Other 1

SRC Program
GRC 11

Center
ACE4S 1
CAIST 1
CDADIC 1
CEMPI 1
CHIRP 1
EBSM 1
IPC 1
NCRC 1
TxACE 1

Thrust/Theme
Pat(MPS) – Patterning 5
Masks 4
CFM&TCM – CFM & Total Chemical M... 3
MTMP – Metrology Tools Matls & P... 2
ADS – Alternative Device Structu... 1
AIHW – Artificial Intelligence H... 1
AMS – Analog and Mixed-Signal De... 1
AMS-CSD – Analog/Mixed-Signal Ci... 1
AdvTech – Advanced Technology 1
Advanced Bipolar SOI-MOS Transis... 1
Advanced Devices 1
Advanced Devices & Technologies 1
Advanced Technology Option 1
Analysis Design & Simulation 1
BEP – Back End Processes 1
Back End Processes 1
C&S – Controls and Sensing 1
CADT – Computer-Aided Design and... 1
CD – Circuit Design 1
CM – Compact Modeling 1
CSR – Cross-Disciplinary Semicon... 1
Contamination Control 1
Cost Reduction 1
DCMOS – Digital CMOS Technologie... 1
DE – Design Environment 1
DSMS – Device Sciences Modeling ... 1
DV – Design Verification 1
Defect Reduction 1
Deposition 1
DesSyn – Design Synthesis 1
DesTech – Design Techniques 1
Doping Technologies 1
EP3C – Efficiency and Performanc... 1
ESH – Environment Safety and Hea... 1
Equip Automation & Process Contr... 1
Equip – Equipment 1
Equip. Auto. and Process Control 1
FACSYS – Factory Systems 1
FAM – Factory Automation & Manag... 1
FEOL – FEOL Processes 1
FacOps – Factory Operations 1
Factory Systems 1
Front End Processes 1
HWS – Hardware Security 1
Heat Signal & Power Distribution 1
Heat Signal Power 1
I3T – Innovative and Intelligent... 1
ISD – Integrated System Design 1
Interconnect Architecture 1
LMD – Logic and Memory Devices 1
LPD – Logic & Physical Design 1
Lithography 1
Logic Design 1
Logistics & Modeling/Simulation 1
MT – Memory Technologies 1
Materials 1
Materials & Measurements 1
Metrology 1
Modeling & Simulation 1
Modeling & TCAD 1
Multi-level Interconnect 1
NCR – Non-Classical CMOS Researc... 1
NEM – Nanoengineered Materials 1
NMP – Nanomanufacturing Material... 1
PAT – Patterning 1
PKG – Packaging 1
PMM – Packaging Materials and Me... 1
PMS – Packaging Modeling and Sim... 1
PS/E – Process Simplification/En... 1
Package & Electrical Design 1
Package Reliability 1
Packaging & Interconnect Systems 1
Packaging Materials Interfaces 1
PatMat – Patterning Materials 1
PatSys – Patterning Systems 1
PhyDes – Physical Design 1
Physical Design 1
Plasma Etch 1
Process Architecture 1
Processes – Processes 1
Quality & Reliability 1
Rapid Yield Learning 1
Reliability 1
Resist 1
SLD – System Level Design 1
SemiSynBio – Semiconductor Synth... 1
Semiconductor Modeling & Simulat... 1
Signal/Power Management 1
Substrates 1
Synthesis & Verification 1
TCAD-MBPS 1
TM – Thermal Management 1
TT – Test & Testability 1
TechCAD – Technology CAD 1
VER – Verification 1

1 through 11 of 11 similar documents, best matches first.   
1: Semiconductor Research Corporation - SRC
GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
Find Similar Documents
2: Systems, Methods and Computer Program Products for Detecting...
Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB
Find Similar Documents
3: Twin Mask, and Method and System for Using Same to Pattern Microelectr...
Twin Mask, and Method and System for Using Same to Pattern Microelectronic Substrates Application Type: Utility Patent Number: 5438204 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0034/
Modified: 1995-08-01 - 22KB
Find Similar Documents
4: Methods, Apparatus and Computer Program Products for Self-Calibrating...
Methods, Apparatus and Computer Program Products for Self-Calibrating Two-Dimensional Metrology Stages Application Type: Utility Patent Number: 5798947 Country: United States ...
URL: https://www.src.org/library/patent/p0017/
Modified: 1998-08-25 - 22KB
Find Similar Documents
5: Langmuir Probe System for Radio Frequency Excited Plasma Processing...
Langmuir Probe System for Radio Frequency Excited Plasma Processing System Application Type: Utility Patent Number: 5339039 Country: United States Status: Filed on 29-Sep-1992, ...
URL: https://www.src.org/library/patent/p0130/
Modified: 1994-08-16 - 22KB
Find Similar Documents
6: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB
Find Similar Documents
7: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Foreign National Patent Number: NI-154578 Country: Taiwan Status: Filed on 21-Feb-2001, ...
URL: https://www.src.org/library/patent/p0267/
Modified: 2002-05-01 - 22KB
Find Similar Documents
8: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Utility Patent Number: 6730443 Country: United States Status: Filed on 12-Feb-2001, Issued on ...
URL: https://www.src.org/library/patent/p0195/
Modified: 2004-05-04 - 22KB
Find Similar Documents
9: Stress-Free Mount for Imaging Mask (Patent P0056) - SRC
Stress-Free Mount for Imaging Mask Application Type: Divisional Patent Number: 5675403 Country: United States Status: Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0056/
Modified: 1997-10-07 - 24KB
Find Similar Documents
10: Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB
Find Similar Documents
11: Apparatus and Method for Shaping and Detecting a Particle Beam...
Apparatus and Method for Shaping and Detecting a Particle Beam Application Type: Utility Patent Number: 5270542 Country: United States Status: Filed on 31-Dec-1992, Issued on ...
URL: https://www.src.org/library/patent/p0197/
Modified: 1993-12-14 - 22KB
Find Similar Documents
1 through 11 of 11 similar documents, best matches first.