[x]
GRC Science Area
LIT – Lithography Sciences
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1 through 11 of
11 similar documents, best matches first. |
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- 1:
Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB Find Similar Documents
- 2:
Systems, Methods and Computer Program Products for Detecting...
- Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB Find Similar Documents
- 3:
Twin Mask, and Method and System for Using Same to Pattern Microelectr...
- Twin Mask, and Method and System for Using Same to Pattern Microelectronic Substrates Application Type: Utility Patent Number: 5438204 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0034/
Modified: 1995-08-01 - 22KB Find Similar Documents
- 4:
Methods, Apparatus and Computer Program Products for Self-Calibrating...
- Methods, Apparatus and Computer Program Products for Self-Calibrating Two-Dimensional Metrology Stages Application Type: Utility Patent Number: 5798947 Country: United States ...
URL: https://www.src.org/library/patent/p0017/
Modified: 1998-08-25 - 22KB Find Similar Documents
- 5:
Langmuir Probe System for Radio Frequency Excited Plasma Processing...
- Langmuir Probe System for Radio Frequency Excited Plasma Processing System Application Type: Utility Patent Number: 5339039 Country: United States Status: Filed on 29-Sep-1992, ...
URL: https://www.src.org/library/patent/p0130/
Modified: 1994-08-16 - 22KB Find Similar Documents
- 6:
Patterning Methods and Systems Using Reflected Interference Patterns...
- Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB Find Similar Documents
- 7:
Patterning Methods and Systems Using Reflected Interference Patterns...
- Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Foreign National Patent Number: NI-154578 Country: Taiwan Status: Filed on 21-Feb-2001, ...
URL: https://www.src.org/library/patent/p0267/
Modified: 2002-05-01 - 22KB Find Similar Documents
- 8:
Patterning Methods and Systems Using Reflected Interference Patterns...
- Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Utility Patent Number: 6730443 Country: United States Status: Filed on 12-Feb-2001, Issued on ...
URL: https://www.src.org/library/patent/p0195/
Modified: 2004-05-04 - 22KB Find Similar Documents
- 9:
Stress-Free Mount for Imaging Mask (Patent P0056) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Divisional Patent Number: 5675403 Country: United States Status: Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0056/
Modified: 1997-10-07 - 24KB Find Similar Documents
- 10:
Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB Find Similar Documents
- 11:
Apparatus and Method for Shaping and Detecting a Particle Beam...
- Apparatus and Method for Shaping and Detecting a Particle Beam Application Type: Utility Patent Number: 5270542 Country: United States Status: Filed on 31-Dec-1992, Issued on ...
URL: https://www.src.org/library/patent/p0197/
Modified: 1993-12-14 - 22KB Find Similar Documents
1 through 11 of
11 similar documents, best matches first. |
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