[x]
GRC Science Area
MPS – Material & Process Sciences
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1 through 14 of
14 similar documents, best matches first. |
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- 1:
Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB Find Similar Documents
- 2:
Method for Patterning a Radiation Sensitive Layer (Patent P0087...
- Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB Find Similar Documents
- 3:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB Find Similar Documents
- 4:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB Find Similar Documents
- 5:
Supermolecular Structures and Devices Made From Same (Patent...
- Supermolecular Structures and Devices Made From Same Application Type: Continuation Patent Number: 6897470 Country: United States Status: Filed on 14-Oct-2003, Issued on ...
URL: https://www.src.org/library/patent/p0425/
Modified: 2005-05-24 - 25KB Find Similar Documents
- 6:
Supermolecular Structures and Devices Made from Same (Patent...
- Supermolecular Structures and Devices Made from Same Application Type: Foreign National Patent Number: 1230406 Country: Taiwan Status: Filed on 23-Feb-2001, Issued on 1-Apr-2005, ...
URL: https://www.src.org/library/patent/p0229/
Modified: 2005-04-01 - 25KB Find Similar Documents
- 7:
Supermolecular Structures and Devices Made from Same (Patent...
- Supermolecular Structures and Devices Made from Same Application Type: Utility Patent Number: 6664559 Country: United States Status: Filed on 23-Feb-2000, Issued on 16-Dec-2003, ...
URL: https://www.src.org/library/patent/p0165/
Modified: 2003-12-16 - 25KB Find Similar Documents
- 8:
Deterministically Doped Field Effect Devices and Methods of Making...
- Deterministically Doped Field Effect Devices and Methods of Making Same Application Type: Continuation (in part) Patent Number: 7015546 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0417/
Modified: 2006-03-21 - 23KB Find Similar Documents
- 9:
Supermolecular Structures and Devices Made From Same (Patent...
- Supermolecular Structures and Devices Made From Same Application Type: European Patent Office Patent Number: EP 2 009 699 Country: United Kingdom Status: Filed on 10-Oct-2008, ...
URL: https://www.src.org/library/patent/p1114/
Modified: 2013-04-24 - 25KB Find Similar Documents
- 10:
Polyelectrolyte Nanolayers as Diffusion Barriers In Semiconductor...
- Polyelectrolyte Nanolayers as Diffusion Barriers In Semiconductor Devices Application Type: Utility Patent Number: 7081674 Country: United States Status: Filed on 11-Jun-2004, ...
URL: https://www.src.org/library/patent/p0466/
Modified: 2006-07-25 - 22KB Find Similar Documents
- 11:
Fluorine Diffusion Barriers for Fuorinated Dielectrics in Integrated...
- Fluorine Diffusion Barriers for Fuorinated Dielectrics in Integrated Circuits Application Type: Utility Patent Number: 6818990 Country: United States Status: Filed on 3-Apr-2000, ...
URL: https://www.src.org/library/patent/p0589/
Modified: 2004-11-16 - 22KB Find Similar Documents
- 12:
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion...
- Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion Application Type: Divisional Patent Number: 7141858 Country: United States Status: Filed on 18-Jun-2004, ...
URL: https://www.src.org/library/patent/p0482/
Modified: 2006-11-28 - 22KB Find Similar Documents
- 13:
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion...
- Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion Application Type: Utility Patent Number: 6794234 Country: United States Status: Filed on 9-Dec-2002, Issued on ...
URL: https://www.src.org/library/patent/p0295/
Modified: 2004-09-21 - 22KB Find Similar Documents
- 14:
Oxidation Resistant High Conductivity Copper Layers For Microelectroni...
- Oxidation Resistant High Conductivity Copper Layers For Microelectronic Applications and Process of Making Same Application Type: Divisional Patent Number: 5959358 Country: United ...
URL: https://www.src.org/library/patent/p0054/
Modified: 1999-09-28 - 24KB Find Similar Documents
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14 similar documents, best matches first. |
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