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GRC Science Area
MPS – Material & Process Sciences
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| 1 through 6 of
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- 1:
Method for Patterning a Radiation Sensitive Layer (Patent P0087...
- Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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- 2:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
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- 3:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
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- 4:
Positive Resist Pattern Formation Through Focused Ion Beam Exposure...
- Positive Resist Pattern Formation Through Focused Ion Beam Exposure and Surface Barrier Silylation Application Type: Continuation (in part) Patent Number: 5362606 Country: United ...
URL: https://www.src.org/library/patent/p0060/
Modified: 1994-11-08 - 21KB
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- 5:
Polyelectrolyte Nanolayers as Diffusion Barriers In Semiconductor...
- Polyelectrolyte Nanolayers as Diffusion Barriers In Semiconductor Devices Application Type: Utility Patent Number: 7081674 Country: United States Status: Filed on 11-Jun-2004, ...
URL: https://www.src.org/library/patent/p0466/
Modified: 2006-07-25 - 22KB
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- 6:
Growth of Inorganic Thin Films using Self-Assembled Monolayers...
- Growth of Inorganic Thin Films using Self-Assembled Monolayers as Nucleation Sites Application Type: Utility Patent Number: 7829150 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1139/
Modified: 2010-11-09 - 22KB
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