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Pat(MPS) – Patterning

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1 through 8 of 8 similar documents, best matches first.

1: Semiconductor Research Corporation - SRC: GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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2: Patterning Methods and Systems Using Reflected Interference Patterns...: Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB
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3: Method and Apparatus for Providing Film Stress Measurements Based...: Method and Apparatus for Providing Film Stress Measurements Based on Substrates Displacement Application Type: Utility Patent Number: 6826491 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0209/
Modified: 2004-11-30 - 22KB
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4: Photoresist Compositions Comprising Norbornene Derivative Polymers...: Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups Application Type: Utility Patent Number: 6103445 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0096/
Modified: 2000-08-15 - 23KB
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5: Multi-Layered Attenuated Phase Shift Mask and a Method for Making...: Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB
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6: Methods for Decreasing Surface Roughness in Novolak-Based Resists...: Methods for Decreasing Surface Roughness in Novolak-Based Resists Application Type: Utility Patent Number: 6162592 Country: United States Status: Filed on 6-Oct-1998, Issued on ...
URL: https://www.src.org/library/patent/p0164/
Modified: 2000-12-19 - 22KB
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7: Guided Self-Assembly of Block Copolymer Films on Interferometrically...: Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Divisional Patent Number: 6926953 Country: United States Status: ...
URL: https://www.src.org/library/patent/p0445/
Modified: 2005-08-09 - 22KB
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8: Guided Self-Assembly of Block Copolymer Films on Interferometrically...: Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Utility Patent Number: 6746825 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0293/
Modified: 2004-06-08 - 23KB
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1 through 8 of 8 similar documents, best matches first.