[x]
GRC Science Area
LIT – Lithography Sciences
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1 through 16 of
16 similar documents, best matches first. |
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- 1:
Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB Find Similar Documents
- 2:
Fabrication of Group III-Nitride Photocathode Having Cs Activation...
- Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB Find Similar Documents
- 3:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB Find Similar Documents
- 4:
Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB Find Similar Documents
- 5:
Water-Processable Photoresist Compositions (Patent P0186) - SRC
- Water-Processable Photoresist Compositions Application Type: Utility Patent Number: 6399273 Country: United States Status: Filed on 14-Aug-2000, Issued on 4-Jun-2002, Patent ...
URL: https://www.src.org/library/patent/p0186/
Modified: 2002-06-04 - 26KB Find Similar Documents
- 6:
Water-Processable Photoresist Compositions (Patent P0272) - SRC
- Water-Processable Photoresist Compositions Application Type: Foreign National Patent Number: 2001-517217 Country: Japan Status: Filed on 14-Aug-2000, Issued on 5-Feb-2005 ...
URL: https://www.src.org/library/patent/p0272/
Modified: 2005-02-05 - 26KB Find Similar Documents
- 7:
Water-Processable Photoresist Compositions (Patent P0282) - SRC
- Water-Processable Photoresist Compositions Application Type: European Patent Office Patent Number: EP1240552 Status: Filed on 14-Aug-2000, Issued on 8-Sep-2005, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0282/
Modified: 2005-09-08 - 26KB Find Similar Documents
- 8:
Patterning Methods and Systems Using Reflected Interference Patterns...
- Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB Find Similar Documents
- 9:
Method and Apparatus for Providing Film Stress Measurements Based...
- Method and Apparatus for Providing Film Stress Measurements Based on Substrates Displacement Application Type: Utility Patent Number: 6826491 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0209/
Modified: 2004-11-30 - 22KB Find Similar Documents
- 10:
Method of Locating Areas in an Image Such as a Photo Mask Layout...
- Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB Find Similar Documents
- 11:
Photoresist Compositions Comprising Norbornene Derivative Polymers...
- Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups Application Type: Utility Patent Number: 6103445 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0096/
Modified: 2000-08-15 - 23KB Find Similar Documents
- 12:
Multi-Layered Attenuated Phase Shift Mask and a Method for Making...
- Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB Find Similar Documents
- 13:
Methods for Decreasing Surface Roughness in Novolak-Based Resists...
- Methods for Decreasing Surface Roughness in Novolak-Based Resists Application Type: Utility Patent Number: 6162592 Country: United States Status: Filed on 6-Oct-1998, Issued on ...
URL: https://www.src.org/library/patent/p0164/
Modified: 2000-12-19 - 22KB Find Similar Documents
- 14:
Guided Self-Assembly of Block Copolymer Films on Interferometrically...
- Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Divisional Patent Number: 6926953 Country: United States Status: ...
URL: https://www.src.org/library/patent/p0445/
Modified: 2005-08-09 - 22KB Find Similar Documents
- 15:
Apparatus and Method for Shaping and Detecting a Particle Beam...
- Apparatus and Method for Shaping and Detecting a Particle Beam Application Type: Utility Patent Number: 5270542 Country: United States Status: Filed on 31-Dec-1992, Issued on ...
URL: https://www.src.org/library/patent/p0197/
Modified: 1993-12-14 - 22KB Find Similar Documents
- 16:
Guided Self-Assembly of Block Copolymer Films on Interferometrically...
- Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Utility Patent Number: 6746825 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0293/
Modified: 2004-06-08 - 23KB Find Similar Documents
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16 similar documents, best matches first. |
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