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Thrust/Theme
PAT – Patterning
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- 1:
Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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- 2:
 NMS Patterning Review Agenda
- NMS Patterning Review Agenda Date: Tuesday, October 4, 2011 - Thursday, October 6, 2011 Location: The Solution Center, Durham, NC 27703 Tuesday, October 4, 2011 7:30 - 8:30 a.m. ...
URL: https://www.src.org/calendar/e004187/e004187-agenda.pdf
Modified: 2011-09-22 - 44KB
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- 3:
Molecular Glass Photoresists (Patent P0566) - SRC
- Molecular Glass Photoresists Application Type: Utility Patent Number: 7452658 Country: United States Status: Filed on 16-Feb-2006, Issued on 18-Nov-2008, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0566/
Modified: 2008-11-18 - 23KB
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- 4:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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- 5:
Organoelement Resists for EUV Lithography and Methods of Making...
- Organoelement Resists for EUV Lithography and Methods of Making the Same Application Type: Utility Patent Number: 7326514 Country: United States Status: Filed on 12-Mar-2004, ...
URL: https://www.src.org/library/patent/p0446/
Modified: 2008-02-05 - 22KB
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- 6:
Molecular Transfer Printing Using Block Copolymers (Patent P1163...
- Molecular Transfer Printing Using Block Copolymers Application Type: Utility Patent Number: 8133341 Country: United States Status: Filed on 1-Apr-2009, Issued on 13-Mar-2012, ...
URL: https://www.src.org/library/patent/p1163/
Modified: 2012-03-13 - 26KB
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- 7:
Molecular Transfer Printing Using Block Copolymers (Patent P1181...
- Molecular Transfer Printing Using Block Copolymers Application Type: Patent Cooperation Treaty Patent Number: PCT/US20090392 Status: Filed on 14-May-2009, Issued on 26-Feb-2011, ...
URL: https://www.src.org/library/patent/p1181/
Modified: 2011-02-26 - 26KB
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CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
- CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB
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- 9:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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- 10:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB
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- 11:
Guided Self-Assembly of Block Copolymer Line Structures for Integrated...
- Guided Self-Assembly of Block Copolymer Line Structures for Integrated Circuit Interconnects Application Type: Utility Patent Number: 8309278 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p1242/
Modified: 2012-11-13 - 24KB
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