Organoelement Resists for EUV Lithography and Methods of Making the Same

    • Application Type:
      Utility
      Patent Number:
      7326514
      Country:
      United States
      Status:
      Filed on 12-Mar-2004, Issued on 5-Feb-2008
      Organization:
      University of Wisconsin - Madison
      SRC Filing ID:
      P0446

    Inventors

    • Franco Cerrina (U of Wisconsin/Madison)
    • Junyan Dai (Cornell)
    • Christopher K. Ober (Cornell)
    • Lin Wang (U of Wisconsin/Madison)
    • Paul Nealey (U of Wisconsin/Madison)

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